This is an intelligent process optimization solution that statistically analyzes the impact of exposure and developing time on etch bias and derives optimal CD control conditions by utilizing LLM-based Data Analysis Agent.
![[μκ°λνκ΅ λ¬λν€] λ°λ체 ν¨ν°λ 곡μ λ°μ΄ν° λΆμ λ° Etch Bias μ΅μ ν μμ΄μ νΈ κ°λ°](https://media.bkamp.ai/uploads/project_thumbnail/1da7e699-8250-4109-8c21-abaa424d7360/7c2c3312-095d-4971-b213-e5be0ba5fb26.png)
μ μ곡ν μ‘Έμ μμ μ λλ€. RAG κΈ°λ°μΌλ‘ ν¬ν 곡μ μμ λμ¨ κ³΅μ λ°μ΄ν°λ₯Ό λΆμνλ κ²μ λͺ©νλ‘ ν©λλ€. -ν¬ν 곡μ csv λ°μ΄ν° νμΌ λ³΄μ -Sentaurus TCAD κΈ°λ° μμ μ€κ³ κ²½ν ζ -[Python] CNN λͺ¨λΈλ§ κ²½ν ζ
This is an intelligent process optimization solution that statistically analyzes the impact of exposure and developing time on etch bias and derives optimal CD control conditions by utilizing LLM-based Data Analysis Agent.
μ μ곡ν μ‘Έμ μμ μ λλ€. RAG κΈ°λ°μΌλ‘ ν¬ν 곡μ μμ λμ¨ κ³΅μ λ°μ΄ν°λ₯Ό λΆμνλ κ²μ λͺ©νλ‘ ν©λλ€. -ν¬ν 곡μ csv λ°μ΄ν° νμΌ λ³΄μ -Sentaurus TCAD κΈ°λ° μμ μ€κ³ κ²½ν ζ -[Python] CNN λͺ¨λΈλ§ κ²½ν ζ
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